Study of Interactions between a-Ta films and SiO2 under rapid thermal annealing

Z. L. Yuan, D. H. Zhang, C. Y. Li, K. Prasad, and C. M. Tan. “Study of Interactions between a-Ta films and SiO2 under rapid thermal annealing,” Thin Solid Films, vol. 462-463, pp. 279, 2004
https://www.sciencedirect.com/science/article/pii/S0040609004006431

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